APA (7th ed.) Citation

Kim, S., Yoon, C., Oh, G., Lee, Y. W., Shin, M., Kee, E. H., . . . Kim, Y. H. (2022). Progressive and Stable Synaptic Plasticity with Femtojoule Energy Consumption by the Interface Engineering of a Metal/Ferroelectric/Semiconductor. Advanced Science, 9(22), 1. https://doi.org/10.1002/advs.202201502

Chicago Style (17th ed.) Citation

Kim, Sohwi, et al. "Progressive and Stable Synaptic Plasticity with Femtojoule Energy Consumption by the Interface Engineering of a Metal/Ferroelectric/Semiconductor." Advanced Science 9, no. 22 (2022): 1. https://doi.org/10.1002/advs.202201502.

MLA (9th ed.) Citation

Kim, Sohwi, et al. "Progressive and Stable Synaptic Plasticity with Femtojoule Energy Consumption by the Interface Engineering of a Metal/Ferroelectric/Semiconductor." Advanced Science, vol. 9, no. 22, 2022, p. 1, https://doi.org/10.1002/advs.202201502.