Interplay Between Stereochemically Active Lone Pair Repulsions, Sigma Hole Interactions, and Delocalized Redox Processes in Topochemical Fluoride‐Ion Insertion.

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Title: Interplay Between Stereochemically Active Lone Pair Repulsions, Sigma Hole Interactions, and Delocalized Redox Processes in Topochemical Fluoride‐Ion Insertion.
Authors: Pakhira, Anindya1 (AUTHOR), Hariyani, Shruti1 (AUTHOR), Agbeworvi, George1 (AUTHOR), Ayala, Jaime R.1 (AUTHOR), Weiland, Conan2 (AUTHOR), Jaye, Cherno2 (AUTHOR), Fischer, Daniel A.2 (AUTHOR), Ma, Lu3 (AUTHOR), Banerjee, Sarbajit1,4,5 (AUTHOR) sbanerje@ethz.ch
Source: Angewandte Chemie International Edition. 8/11/2025, Vol. 64 Issue 33, p1-10. 10p.
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  Data: Interplay Between Stereochemically Active Lone Pair Repulsions, Sigma Hole Interactions, and Delocalized Redox Processes in Topochemical Fluoride‐Ion Insertion.
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  Data: <searchLink fieldCode="JN" term="%22Angewandte+Chemie+International+Edition%22">Angewandte Chemie International Edition</searchLink>. 8/11/2025, Vol. 64 Issue 33, p1-10. 10p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=187256957
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