Interplay Between Stereochemically Active Lone Pair Repulsions, Sigma Hole Interactions, and Delocalized Redox Processes in Topochemical Fluoride‐Ion Insertion.
Saved in:
| Title: | Interplay Between Stereochemically Active Lone Pair Repulsions, Sigma Hole Interactions, and Delocalized Redox Processes in Topochemical Fluoride‐Ion Insertion. |
|---|---|
| Authors: | Pakhira, Anindya1 (AUTHOR), Hariyani, Shruti1 (AUTHOR), Agbeworvi, George1 (AUTHOR), Ayala, Jaime R.1 (AUTHOR), Weiland, Conan2 (AUTHOR), Jaye, Cherno2 (AUTHOR), Fischer, Daniel A.2 (AUTHOR), Ma, Lu3 (AUTHOR), Banerjee, Sarbajit1,4,5 (AUTHOR) sbanerje@ethz.ch |
| Source: | Angewandte Chemie International Edition. 8/11/2025, Vol. 64 Issue 33, p1-10. 10p. |
| Database: | Academic Search Ultimate |
|
Full text is not displayed to guests.
Login for full access.
|
|
Be the first to leave a comment!
