APA (7th ed.) Citation

Yan, L., Xu, Z., Grygiel, C., McMitchell, S., Suchomel, M., Bacsa, J., . . . Rosseinsky, M. (2011). SrHfTiO high- k films deposited on Si by pulsed laser deposition. Applied Physics A: Materials Science & Processing, 104(1), 447. https://doi.org/10.1007/s00339-011-6257-8

Chicago Style (17th ed.) Citation

Yan, L., et al. "SrHfTiO High- K Films Deposited on Si by Pulsed Laser Deposition." Applied Physics A: Materials Science & Processing 104, no. 1 (2011): 447. https://doi.org/10.1007/s00339-011-6257-8.

MLA (9th ed.) Citation

Yan, L., et al. "SrHfTiO High- K Films Deposited on Si by Pulsed Laser Deposition." Applied Physics A: Materials Science & Processing, vol. 104, no. 1, 2011, p. 447, https://doi.org/10.1007/s00339-011-6257-8.