APA (7th ed.) Citation

Takidani, Y., Morimoto, K., Kondo, K., Ueki, T., Tomita, T., Tanaka, Y., & Okada, T. (2015). Low-Temperature Diffusion at Ni/SiC Interface with the Aid of Femtosecond Laser-Induced Strain. Journal of Laser Micro / Nanoengineering, 10(3), 314. https://doi.org/10.2961/jlmn.2015.03.0014

Chicago Style (17th ed.) Citation

Takidani, Yusuke, Kazuki Morimoto, Kenta Kondo, Tomoyuki Ueki, Takuro Tomita, Yasuhiro Tanaka, and Tatsuya Okada. "Low-Temperature Diffusion at Ni/SiC Interface with the Aid of Femtosecond Laser-Induced Strain." Journal of Laser Micro / Nanoengineering 10, no. 3 (2015): 314. https://doi.org/10.2961/jlmn.2015.03.0014.

MLA (9th ed.) Citation

Takidani, Yusuke, et al. "Low-Temperature Diffusion at Ni/SiC Interface with the Aid of Femtosecond Laser-Induced Strain." Journal of Laser Micro / Nanoengineering, vol. 10, no. 3, 2015, p. 314, https://doi.org/10.2961/jlmn.2015.03.0014.