Sequential sputtered Co-HfO2 granular films.
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| Title: | Sequential sputtered Co-HfO2 granular films. |
|---|---|
| Authors: | Chadha, M.1, Ng, V.1 |
| Source: | Journal of Magnetism & Magnetic Materials. Mar2017, Vol. 426, p302-309. 8p. |
| Subjects: | Cobalt compounds, Magnetron sputtering, Hafnium oxide films, Ferromagnetism, Metal microstructure |
| Abstract: | A systematic study of magnetic, magneto-transport and micro-structural properties of Co-HfO 2 granular films fabricated by sequential sputtering is presented. We demonstrate reduction in ferromagnetic-oxide formation by using HfO 2 as the insulting matrix. Microstructure evaluation of the films showed that the film structure consisted of discrete hcp-Co grains embedded in HfO 2 matrix. Films with varying compositions were prepared and their macroscopic properties were studied. We correlate the variation in these properties to the variation in film microstructure. Our study shows that Co-HfO 2 films with reduced cobalt oxide and varying properties can be prepared using sequential sputtering technique. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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