Improvement of "Pest" Resistance of MoSi2 Intermetallic Compound at 500 °C and 600 °C via Addition of B Fabricated by Spark Plasma Sintering.
Saved in:
| Title: | Improvement of "Pest" Resistance of MoSi |
|---|---|
| Authors: | Wen, S. H.1 (AUTHOR), Sha, J. B.1 (AUTHOR) jbsha@sina.com |
| Source: | Oxidation of Metals. Oct2019, Vol. 92 Issue 3/4, p243-257. 15p. |
| Subjects: | Intermetallic compounds, Alloy powders, Silicon alloys, Sintering, Powder metallurgy, Pests |
| Abstract: | Mo–Si–B alloys were obtained by spark plasma sintering (SPS) using fine Mo–Si–B alloy powders with a particle size of 2.5 μm. The SPS Mo–Si–B alloys consisted of fine MoSi2/Mo2Bi5(Mo5Si3)/MoB/SiO2 phases. Under isothermal conditions, the weight-gain kinetics of the Mo–Si–B alloys obtained by SPS exhibited parabolic time dependence and these Mo–Si–B alloys showed better oxidation resistance at moderate temperatures of 500 °C and 600 °C with no "pest" failure. The oxide scale on the sample surface consisted of MoO3, amorphous borosilicate and crystalloid SiO2 phases. An increase in the oxidation temperature from 500 to 600 °C caused a significantly higher fluidity and a shorter incubation stage for the formation of a continuously protective borosilicate layer, so that the mass gain was smaller than 1 mg/cm2 for oxidation at 600 °C for 100 h, which corresponds to the excellent oxidation resistance. [ABSTRACT FROM AUTHOR] |
| Copyright of Oxidation of Metals is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
Be the first to leave a comment!