APA (7th ed.) Citation

Kim, M., Jang, M., Jung, M., Han, H., Jung, S., Song, Y., . . . Jeong Kim, Y. (2025). A Study on Particle Emission Efficiency of a Plasma Enhanced Chemical Vapor Deposition Chamber During Periodic Cycle Purge Process Using an Improved Single Particle Light Scattering Method. IEEE Transactions on Semiconductor Manufacturing, 38(3), 667. https://doi.org/10.1109/TSM.2025.3572028

Chicago Style (17th ed.) Citation

Kim, Myungjoon, et al. "A Study on Particle Emission Efficiency of a Plasma Enhanced Chemical Vapor Deposition Chamber During Periodic Cycle Purge Process Using an Improved Single Particle Light Scattering Method." IEEE Transactions on Semiconductor Manufacturing 38, no. 3 (2025): 667. https://doi.org/10.1109/TSM.2025.3572028.

MLA (9th ed.) Citation

Kim, Myungjoon, et al. "A Study on Particle Emission Efficiency of a Plasma Enhanced Chemical Vapor Deposition Chamber During Periodic Cycle Purge Process Using an Improved Single Particle Light Scattering Method." IEEE Transactions on Semiconductor Manufacturing, vol. 38, no. 3, 2025, p. 667, https://doi.org/10.1109/TSM.2025.3572028.