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Chemical Mechanical Polishing of Zerodur ® Using Silica and Ceria Nanoparticles: Toward Ultra-Smooth Optical Surfaces.

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Title: Chemical Mechanical Polishing of Zerodur ® Using Silica and Ceria Nanoparticles: Toward Ultra-Smooth Optical Surfaces.
Authors: Bellahsene, Houda1 (AUTHOR), Sene, Saad1,2 (AUTHOR), Félix, Gautier1,3 (AUTHOR), Fabregue, Nicolas1 (AUTHOR), Marcos, Michel2 (AUTHOR), Uhart, Arnaud3 (AUTHOR), Dupin, Jean-Charles3 (AUTHOR), Oliviero, Erwan1 (AUTHOR), Larionova, Joulia1 (AUTHOR), Ferrari, Marc2 (AUTHOR) marc.ferrari@osupytheas.fr, Guari, Yannick1 (AUTHOR) yannick.guari@umontpellier.fr
Source: Nanomaterials (2079-4991). Sep2025, Vol. 15 Issue 18, p1391. 29p.
Subjects: Silica nanoparticles, Cerium oxides, Surface texture, Optical devices, Finishes & finishing, Optical glass, Optical coatings, Nanoparticles
Abstract: This study investigates hyperpolishing of Zerodur® substrates via chemical-mechanical polishing (CMP) using silica (SiO2) and ceria (CeO2) nanoparticles as controlled nano-abrasives. A pre-polishing stress-mirror stage was combined with systematic use of nanoparticles of variable size to evaluate surface-state evolution via optical rugosimeter, HRSEM, cross-sectional HRTEM, and XPS. A set of hexagonal mirrors with a circumscribed diameter of 30 mm was polished for one hour with each nanoparticle type. All tested slurries significantly improved surface quality, with both the smallest (37 nm) and largest (209 nm) SiO2 particles achieving similar final roughness, though larger particles showed a slight performance advantage that could be offset by longer polishing with smaller particles. CeO2 nanoparticles (30 nm) produced even better process efficiency and surface finishes than 37 nm SiO2, demonstrating higher chemical-mechanical polishing efficiency with CeO2. Sequential polishing strategies, first with 209 nm SiO2, then with 37 nm SiO2 and 30 nm CeO2, also enhanced surface quality, confirming trends from single-particle trials. One of the most effective protocols was adapted and scaled up to 135 mm Zerodur® mirrors with spherical and plano geometries, representative of precision optical components. The strategic approach adopted to achieve a high-quality surface finish in a reduced processing time relies on the sequential use of nanoparticles acting as complementary nano-abrasives. Indeed, applying two hours of polishing with 209 nm SiO2 followed by two hours with 37 nm SiO2 yielded exceptional results, with area roughness (Sa) values of 1 Å for spherical and 0.9 Å for plano surfaces. These results demonstrate the capability of nanoparticle-assisted CMP to produce sub-nanometric surface finishes and offer a robust, scalable approach for high-end optical manufacturing. [ABSTRACT FROM AUTHOR]
Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Chemical Mechanical Polishing of Zerodur ® Using Silica and Ceria Nanoparticles: Toward Ultra-Smooth Optical Surfaces.
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  Data: <searchLink fieldCode="AR" term="%22Bellahsene%2C+Houda%22">Bellahsene, Houda</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Sene%2C+Saad%22">Sene, Saad</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Félix%2C+Gautier%22">Félix, Gautier</searchLink><relatesTo>1,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Fabregue%2C+Nicolas%22">Fabregue, Nicolas</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Marcos%2C+Michel%22">Marcos, Michel</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Uhart%2C+Arnaud%22">Uhart, Arnaud</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Dupin%2C+Jean-Charles%22">Dupin, Jean-Charles</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Oliviero%2C+Erwan%22">Oliviero, Erwan</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Larionova%2C+Joulia%22">Larionova, Joulia</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ferrari%2C+Marc%22">Ferrari, Marc</searchLink><relatesTo>2</relatesTo> (AUTHOR)<i> marc.ferrari@osupytheas.fr</i><br /><searchLink fieldCode="AR" term="%22Guari%2C+Yannick%22">Guari, Yannick</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> yannick.guari@umontpellier.fr</i>
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  Data: <searchLink fieldCode="DE" term="%22Silica+nanoparticles%22">Silica nanoparticles</searchLink><br /><searchLink fieldCode="DE" term="%22Cerium+oxides%22">Cerium oxides</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+texture%22">Surface texture</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+devices%22">Optical devices</searchLink><br /><searchLink fieldCode="DE" term="%22Finishes+%26+finishing%22">Finishes & finishing</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+glass%22">Optical glass</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+coatings%22">Optical coatings</searchLink><br /><searchLink fieldCode="DE" term="%22Nanoparticles%22">Nanoparticles</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: This study investigates hyperpolishing of Zerodur® substrates via chemical-mechanical polishing (CMP) using silica (SiO2) and ceria (CeO2) nanoparticles as controlled nano-abrasives. A pre-polishing stress-mirror stage was combined with systematic use of nanoparticles of variable size to evaluate surface-state evolution via optical rugosimeter, HRSEM, cross-sectional HRTEM, and XPS. A set of hexagonal mirrors with a circumscribed diameter of 30 mm was polished for one hour with each nanoparticle type. All tested slurries significantly improved surface quality, with both the smallest (37 nm) and largest (209 nm) SiO2 particles achieving similar final roughness, though larger particles showed a slight performance advantage that could be offset by longer polishing with smaller particles. CeO2 nanoparticles (30 nm) produced even better process efficiency and surface finishes than 37 nm SiO2, demonstrating higher chemical-mechanical polishing efficiency with CeO2. Sequential polishing strategies, first with 209 nm SiO2, then with 37 nm SiO2 and 30 nm CeO2, also enhanced surface quality, confirming trends from single-particle trials. One of the most effective protocols was adapted and scaled up to 135 mm Zerodur® mirrors with spherical and plano geometries, representative of precision optical components. The strategic approach adopted to achieve a high-quality surface finish in a reduced processing time relies on the sequential use of nanoparticles acting as complementary nano-abrasives. Indeed, applying two hours of polishing with 209 nm SiO2 followed by two hours with 37 nm SiO2 yielded exceptional results, with area roughness (Sa) values of 1 Å for spherical and 0.9 Å for plano surfaces. These results demonstrate the capability of nanoparticle-assisted CMP to produce sub-nanometric surface finishes and offer a robust, scalable approach for high-end optical manufacturing. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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      – Type: doi
        Value: 10.3390/nano15181391
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 29
        StartPage: 1391
    Subjects:
      – SubjectFull: Silica nanoparticles
        Type: general
      – SubjectFull: Cerium oxides
        Type: general
      – SubjectFull: Surface texture
        Type: general
      – SubjectFull: Optical devices
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              Text: Sep2025
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