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Title: Light work.
Authors: Thompson, Clive (AUTHOR)
Source: MIT Technology Review. Jul/Aug2026, Vol. 129 Issue 4, p24-33. 10p. 5 Color Photographs.
Subjects: Extreme ultraviolet lithography, ASML Holding NV, Geopolitics, Artificial intelligence, Integrated circuits
Abstract: The article focuses on ASML, a Dutch company that holds a near-monopoly on extreme-ultraviolet (EUV) lithography machines essential for manufacturing advanced microchips used in AI and other technologies. ASML’s latest high-numerical-aperture (high-NA) EUV machine enables finer chip features at eight nanometers, supporting the ongoing demand for faster, denser chips, particularly driven by AI development. While ASML dominates about 90% of the chip lithography market, geopolitical tensions, especially U.S. export restrictions on China, have spurred efforts by China and startups like Substrate and Lace Lithography to develop alternative chipmaking technologies. Despite these challengers, ASML’s engineering expertise and incremental innovations position it to maintain leadership in chip manufacturing through the 2030s, though the industry continues to explore new lithography methods for the future. [Extracted from the article]
Copyright of MIT Technology Review is the property of MIT Technology Review and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: <searchLink fieldCode="DE" term="%22Extreme+ultraviolet+lithography%22">Extreme ultraviolet lithography</searchLink><br /><searchLink fieldCode="DE" term="%22ASML+Holding+NV%22">ASML Holding NV</searchLink><br /><searchLink fieldCode="DE" term="%22Geopolitics%22">Geopolitics</searchLink><br /><searchLink fieldCode="DE" term="%22Artificial+intelligence%22">Artificial intelligence</searchLink><br /><searchLink fieldCode="DE" term="%22Integrated+circuits%22">Integrated circuits</searchLink>
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  Data: The article focuses on ASML, a Dutch company that holds a near-monopoly on extreme-ultraviolet (EUV) lithography machines essential for manufacturing advanced microchips used in AI and other technologies. ASML’s latest high-numerical-aperture (high-NA) EUV machine enables finer chip features at eight nanometers, supporting the ongoing demand for faster, denser chips, particularly driven by AI development. While ASML dominates about 90% of the chip lithography market, geopolitical tensions, especially U.S. export restrictions on China, have spurred efforts by China and startups like Substrate and Lace Lithography to develop alternative chipmaking technologies. Despite these challengers, ASML’s engineering expertise and incremental innovations position it to maintain leadership in chip manufacturing through the 2030s, though the industry continues to explore new lithography methods for the future. [Extracted from the article]
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  Data: <i>Copyright of MIT Technology Review is the property of MIT Technology Review and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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      – Code: eng
        Text: English
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      – SubjectFull: Extreme ultraviolet lithography
        Type: general
      – SubjectFull: ASML Holding NV
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      – TitleFull: Light work.
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              Text: Jul/Aug2026
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