Light work.
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| Title: | Light work. |
|---|---|
| Authors: | Thompson, Clive (AUTHOR) |
| Source: | MIT Technology Review. Jul/Aug2026, Vol. 129 Issue 4, p24-33. 10p. 5 Color Photographs. |
| Subjects: | Extreme ultraviolet lithography, ASML Holding NV, Geopolitics, Artificial intelligence, Integrated circuits |
| Abstract: | The article focuses on ASML, a Dutch company that holds a near-monopoly on extreme-ultraviolet (EUV) lithography machines essential for manufacturing advanced microchips used in AI and other technologies. ASML’s latest high-numerical-aperture (high-NA) EUV machine enables finer chip features at eight nanometers, supporting the ongoing demand for faster, denser chips, particularly driven by AI development. While ASML dominates about 90% of the chip lithography market, geopolitical tensions, especially U.S. export restrictions on China, have spurred efforts by China and startups like Substrate and Lace Lithography to develop alternative chipmaking technologies. Despite these challengers, ASML’s engineering expertise and incremental innovations position it to maintain leadership in chip manufacturing through the 2030s, though the industry continues to explore new lithography methods for the future. [Extracted from the article] |
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| Database: | Engineering Source |
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