APA (7th ed.) Citation

Ogura, A., Imai, S., Kagawa, T., Kurozaki, H., Ishikawa, M., Muramoto, I., . . . Ohshita, Y. (2008). W chemical-vapor deposition using (i-C3H7C5H4)2WH2. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 26(4), 561. https://doi.org/10.1116/1.2913581

Chicago Style (17th ed.) Citation

Ogura, Atsushi, Satoshi Imai, Taihei Kagawa, Hirotaka Kurozaki, Masato Ishikawa, Ikuyo Muramoto, Hideaki Machida, and Yoshio Ohshita. "W Chemical-vapor Deposition Using (i-C3H7C5H4)2WH2." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 26, no. 4 (2008): 561. https://doi.org/10.1116/1.2913581.

MLA (9th ed.) Citation

Ogura, Atsushi, et al. "W Chemical-vapor Deposition Using (i-C3H7C5H4)2WH2." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 26, no. 4, 2008, p. 561, https://doi.org/10.1116/1.2913581.