W chemical-vapor deposition using (i-C3H7C5H4)2WH2. - Ogura, Atsushi; Imai, Satoshi; Kagawa, Taihei; Kurozaki, Hirotaka; Ishikawa, Masato; Muramoto, Ikuyo; Machida, Hideaki; Ohshita, Yoshio (Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 2008)