APA (7th ed.) Citation

Takashiri, M., & Tabuchi, T. (2010). Development of microcrystalline silicon thin films with high deposition rate (over 10nm/s) using VHF hollow electrode enhanced glow plasma. Surface & Coatings Technology, 204(21/22), 3525. https://doi.org/10.1016/j.surfcoat.2010.04.013

Chicago Style (17th ed.) Citation

Takashiri, M., and T. Tabuchi. "Development of Microcrystalline Silicon Thin Films with High Deposition Rate (over 10nm/s) Using VHF Hollow Electrode Enhanced Glow Plasma." Surface & Coatings Technology 204, no. 21/22 (2010): 3525. https://doi.org/10.1016/j.surfcoat.2010.04.013.

MLA (9th ed.) Citation

Takashiri, M., and T. Tabuchi. "Development of Microcrystalline Silicon Thin Films with High Deposition Rate (over 10nm/s) Using VHF Hollow Electrode Enhanced Glow Plasma." Surface & Coatings Technology, vol. 204, no. 21/22, 2010, p. 3525, https://doi.org/10.1016/j.surfcoat.2010.04.013.