APA (7th ed.) Citation

Moreira, M., Doi, I., Souza, J., & Diniz, J. (2011). Electrical characterization and morphological properties of AlN films prepared by dc reactive magnetron sputtering. Microelectronic Engineering, 88(5), 802. https://doi.org/10.1016/j.mee.2010.06.045

Chicago Style (17th ed.) Citation

Moreira, M.A, I. Doi, J.F Souza, and J.A Diniz. "Electrical Characterization and Morphological Properties of AlN Films Prepared by Dc Reactive Magnetron Sputtering." Microelectronic Engineering 88, no. 5 (2011): 802. https://doi.org/10.1016/j.mee.2010.06.045.

MLA (9th ed.) Citation

Moreira, M.A, et al. "Electrical Characterization and Morphological Properties of AlN Films Prepared by Dc Reactive Magnetron Sputtering." Microelectronic Engineering, vol. 88, no. 5, 2011, p. 802, https://doi.org/10.1016/j.mee.2010.06.045.