APA (7th ed.) Citation

Poorreza, E., & Dadashzadeh Gargari, N. (2025). Computer Modeling and Simulation of an Argon Gas Plasma Produced by Inductively Coupled Plasma Method with Variable Input Powers and Dielectric Thickness. High Energy Chemistry, 59(1), 77. https://doi.org/10.1134/S0018143924701510

Chicago Style (17th ed.) Citation

Poorreza, E., and N. Dadashzadeh Gargari. "Computer Modeling and Simulation of an Argon Gas Plasma Produced by Inductively Coupled Plasma Method with Variable Input Powers and Dielectric Thickness." High Energy Chemistry 59, no. 1 (2025): 77. https://doi.org/10.1134/S0018143924701510.

MLA (9th ed.) Citation

Poorreza, E., and N. Dadashzadeh Gargari. "Computer Modeling and Simulation of an Argon Gas Plasma Produced by Inductively Coupled Plasma Method with Variable Input Powers and Dielectric Thickness." High Energy Chemistry, vol. 59, no. 1, 2025, p. 77, https://doi.org/10.1134/S0018143924701510.