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Computer Modeling and Simulation of an Argon Gas Plasma Produced by Inductively Coupled Plasma Method with Variable Input Powers and Dielectric Thickness.

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Title: Computer Modeling and Simulation of an Argon Gas Plasma Produced by Inductively Coupled Plasma Method with Variable Input Powers and Dielectric Thickness.
Authors: Poorreza, E.1 (AUTHOR) elnaz.poorreza@gmail.com, Dadashzadeh Gargari, N.2 (AUTHOR)
Source: High Energy Chemistry. Feb2025, Vol. 59 Issue 1, p77-86. 10p.
Database: Environment Complete
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An: 184166920
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  Data: Computer Modeling and Simulation of an Argon Gas Plasma Produced by Inductively Coupled Plasma Method with Variable Input Powers and Dielectric Thickness.
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  Data: <searchLink fieldCode="AR" term="%22Poorreza%2C+E%2E%22">Poorreza, E.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> elnaz.poorreza@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Dadashzadeh+Gargari%2C+N%2E%22">Dadashzadeh Gargari, N.</searchLink><relatesTo>2</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22High+Energy+Chemistry%22">High Energy Chemistry</searchLink>. Feb2025, Vol. 59 Issue 1, p77-86. 10p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=eih&AN=184166920
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        Value: 10.1134/S0018143924701510
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      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 77
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      – TitleFull: Computer Modeling and Simulation of an Argon Gas Plasma Produced by Inductively Coupled Plasma Method with Variable Input Powers and Dielectric Thickness.
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              Text: Feb2025
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              Y: 2025
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