Colloidal CsPbX3 (X = Cl, Br, I) Nanocrystals 2.0: Zwitterionic Capping Ligands for Improved Durability and Stability.

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Title: Colloidal CsPbX3 (X = Cl, Br, I) Nanocrystals 2.0: Zwitterionic Capping Ligands for Improved Durability and Stability.
Authors: Krieg F; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Ochsenbein ST; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Yakunin S; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Ten Brinck S; Department of Theoretical Chemistry, Faculty of Science, Vrije Universiteit Amsterdam, de Boelelaan 1083, 1081 HV Amsterdam, The Netherlands., Aellen P; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Süess A; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Clerc B; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Guggisberg D; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Nazarenko O; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Shynkarenko Y; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland., Kumar S; Institute of Chemical and Bioengineering, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland., Shih CJ; Institute of Chemical and Bioengineering, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland., Infante I; Department of Theoretical Chemistry, Faculty of Science, Vrije Universiteit Amsterdam, de Boelelaan 1083, 1081 HV Amsterdam, The Netherlands., Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Bioscience, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.
Source: ACS energy letters [ACS Energy Lett] 2018 Mar 09; Vol. 3 (3), pp. 641-646. Date of Electronic Publication: 2018 Feb 09.
Publication Type: Journal Article
Journal Info: Publisher: American Chemical Society Country of Publication: United States NLM ID: 101697523 Publication Model: Print-Electronic Cited Medium: Print ISSN: 2380-8195 (Print) NLM ISO Abbreviation: ACS Energy Lett Subsets: PubMed not MEDLINE
Database: MEDLINE Ultimate
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