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Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability.

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Title: Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability.
Authors: Mattinen M; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi.; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA., Schröder J; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA., Hatanpää T; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi., Popov G; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi., Mizohata K; Division of Materials Physics, Department of Physics, University of Helsinki P. O. Box 43 FI-00014 Finland., Leskelä M; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi., Jaramillo TF; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA.; Department of Energy Science and Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA., Stevens MB; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA., Bent SF; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; Department of Energy Science and Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA., Ritala M; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi.
Source: Journal of materials chemistry. A [J Mater Chem A Mater] 2025 Jul 10; Vol. 13 (31), pp. 25703-25714. Date of Electronic Publication: 2025 Jul 10 (Print Publication: 2025).
Publication Type: Journal Article
Journal Info: Publisher: Royal Society of Chemistry Pub Country of Publication: England NLM ID: 101596773 Publication Model: eCollection Cited Medium: Print ISSN: 2050-7488 (Print) NLM ISO Abbreviation: J Mater Chem A Mater Subsets: PubMed not MEDLINE
Database: MEDLINE Ultimate
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  Data: Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability.
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  Data: <searchLink fieldCode="AU" term="%22Mattinen+M%22">Mattinen M</searchLink>; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi.; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.<br /><searchLink fieldCode="AU" term="%22Schröder+J%22">Schröder J</searchLink>; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA.<br /><searchLink fieldCode="AU" term="%22Hatanpää+T%22">Hatanpää T</searchLink>; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi.<br /><searchLink fieldCode="AU" term="%22Popov+G%22">Popov G</searchLink>; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi.<br /><searchLink fieldCode="AU" term="%22Mizohata+K%22">Mizohata K</searchLink>; Division of Materials Physics, Department of Physics, University of Helsinki P. O. Box 43 FI-00014 Finland.<br /><searchLink fieldCode="AU" term="%22Leskelä+M%22">Leskelä M</searchLink>; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi.<br /><searchLink fieldCode="AU" term="%22Jaramillo+TF%22">Jaramillo TF</searchLink>; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA.; Department of Energy Science and Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.<br /><searchLink fieldCode="AU" term="%22Stevens+MB%22">Stevens MB</searchLink>; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA.<br /><searchLink fieldCode="AU" term="%22Bent+SF%22">Bent SF</searchLink>; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; Department of Energy Science and Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.<br /><searchLink fieldCode="AU" term="%22Ritala+M%22">Ritala M</searchLink>; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi.
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  Data: <searchLink fieldCode="JN" term="%22101596773%22">Journal of materials chemistry. A</searchLink> [J Mater Chem A Mater] 2025 Jul 10; Vol. 13 (31), pp. 25703-25714. <i>Date of Electronic Publication: </i>2025 Jul 10 (<i>Print Publication: </i>2025).
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              Text: 2025 Jul 10
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