Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability.
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| Title: | Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability. |
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| Authors: | Mattinen M; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi.; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA., Schröder J; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA., Hatanpää T; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi., Popov G; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi., Mizohata K; Division of Materials Physics, Department of Physics, University of Helsinki P. O. Box 43 FI-00014 Finland., Leskelä M; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi., Jaramillo TF; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA.; Department of Energy Science and Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA., Stevens MB; SUNCAT Center for Interface Science and Catalysis, SLAC National Accelerator Laboratory 2575 Sand Hill Road Menlo Park California 94025 USA., Bent SF; Department of Chemical Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA.; Department of Energy Science and Engineering, Stanford University 443 Via Ortega Stanford California 94305 USA., Ritala M; Department of Chemistry, University of Helsinki P. O. Box 55 FI-00014 Finland miika.mattinen@helsinki.fi mikko.ritala@helsinki.fi. |
| Source: | Journal of materials chemistry. A [J Mater Chem A Mater] 2025 Jul 10; Vol. 13 (31), pp. 25703-25714. Date of Electronic Publication: 2025 Jul 10 (Print Publication: 2025). |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: Royal Society of Chemistry Pub Country of Publication: England NLM ID: 101596773 Publication Model: eCollection Cited Medium: Print ISSN: 2050-7488 (Print) NLM ISO Abbreviation: J Mater Chem A Mater Subsets: PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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