Formation mechanism of pinholes in electroplated Cu films and its mitigation.
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| Title: | Formation mechanism of pinholes in electroplated Cu films and its mitigation. |
|---|---|
| Authors: | Chen, Chang-Chih1, Hsieh, Cheng-Hui2, Lee, Yu-Wei1, Yang, Cheng-Hsien1, Ho, Cheng-En1, ceho1975@hotmail.com |
| Source: | Thin Solid Films; Dec2015, Vol. 596, p209-215, 7p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 111419347 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=111419347 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.tsf.2015.07.063 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 7 StartPage: 209 Titles: – TitleFull: Formation mechanism of pinholes in electroplated Cu films and its mitigation. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Chen, Chang-Chih – PersonEntity: Name: NameFull: Hsieh, Cheng-Hui – PersonEntity: Name: NameFull: Lee, Yu-Wei – PersonEntity: Name: NameFull: Yang, Cheng-Hsien – PersonEntity: Name: NameFull: Ho, Cheng-En IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 12 Text: Dec2015 Type: published Y: 2015 Identifiers: – Type: issn-print Value: 00406090 Numbering: – Type: volume Value: 596 Titles: – TitleFull: Thin Solid Films Type: main |
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