APA (7th ed.) Citation

Denysenko, I. B., Ostrikov, K., Xu, S., Yu, M., & Diong, C. H. (2003). Nanopowder management and control of plasma parameters in electronegative SiH[sub 4] plasmas. Journal of Applied Physics, 94(9), 6097. https://doi.org/10.1063/1.1618356

Chicago Style (17th ed.) Citation

Denysenko, I. B., K. Ostrikov, S. Xu, M.Y Yu, and C. H. Diong. "Nanopowder Management and Control of Plasma Parameters in Electronegative SiH[sub 4] Plasmas." Journal of Applied Physics 94, no. 9 (2003): 6097. https://doi.org/10.1063/1.1618356.

MLA (9th ed.) Citation

Denysenko, I. B., et al. "Nanopowder Management and Control of Plasma Parameters in Electronegative SiH[sub 4] Plasmas." Journal of Applied Physics, vol. 94, no. 9, 2003, p. 6097, https://doi.org/10.1063/1.1618356.