High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films.
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| Title: | High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films. |
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| Authors: | Frischmuth, Tobias1, tobias.frischmuth@tuwien.ac.at, Schneider, Michael1, Maurer, Daniel2, Grille, Thomas2, Schmid, Ulrich1 |
| Source: | Thin Solid Films; Jul2016, Vol. 611, p6-11, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00406090 |
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| DOI: | 10.1016/j.tsf.2016.05.001 |
