APA (7th ed.) Citation

Frischmuth, T., Schneider, M., Maurer, D., Grille, T., & Schmid, U. (2016). High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC: H thin films. Thin Solid Films, 611, 6. https://doi.org/10.1016/j.tsf.2016.05.001

Chicago Style (17th ed.) Citation

Frischmuth, Tobias, Michael Schneider, Daniel Maurer, Thomas Grille, and Ulrich Schmid. "High Temperature Annealing Effects on the Chemical and Mechanical Properties of Inductively-coupled Plasma-enhanced Chemical Vapor Deposited A-SiC: H Thin Films." Thin Solid Films 611 (2016): 6. https://doi.org/10.1016/j.tsf.2016.05.001.

MLA (9th ed.) Citation

Frischmuth, Tobias, et al. "High Temperature Annealing Effects on the Chemical and Mechanical Properties of Inductively-coupled Plasma-enhanced Chemical Vapor Deposited A-SiC: H Thin Films." Thin Solid Films, vol. 611, 2016, p. 6, https://doi.org/10.1016/j.tsf.2016.05.001.