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High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films.

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Title: High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films.
Authors: Frischmuth, Tobias1, tobias.frischmuth@tuwien.ac.at, Schneider, Michael1, Maurer, Daniel2, Grille, Thomas2, Schmid, Ulrich1
Source: Thin Solid Films; Jul2016, Vol. 611, p6-11, 6p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 116087909
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films.
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  Data: <searchLink fieldCode="JN" term="%22Thin+Solid+Films%22">Thin Solid Films</searchLink>; Jul2016, Vol. 611, p6-11, 6p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=116087909
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        Value: 10.1016/j.tsf.2016.05.001
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      – Code: eng
        Text: English
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      – TitleFull: High temperature annealing effects on the chemical and mechanical properties of inductively-coupled plasma-enhanced chemical vapor deposited a-SiC:H thin films.
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            NameFull: Schneider, Michael
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              Text: Jul2016
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              Value: 611
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