Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed.
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| Title: | Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed. |
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| Authors: | Tial, Mai1, maikai@stu.kanazawa-u.ac.jp, Tanaka, Yasunori, tanaka@ec.t.kanazawa-u.ac.jp, Maruyama, Yuji1, Tsuchiya, Takumi1, Uesugi, Yoshihiko, Ishijima, Tatsuo2 |
| Source: | Plasma Chemistry & Plasma Processing; May2017, Vol. 37 Issue 3, p857-876, 20p |
| Database: | Applied Science & Technology Source |
| ISSN: | 02724324 |
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| DOI: | 10.1007/s11090-017-9803-0 |
