APA (7th ed.) Citation

Tial, M., Tanaka, Y., Maruyama, Y., Tsuchiya, T., Uesugi, Y., & Ishijima, T. (2017). Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed. Plasma Chemistry & Plasma Processing, 37(3), 857. https://doi.org/10.1007/s11090-017-9803-0

Chicago Style (17th ed.) Citation

Tial, Mai, Yasunori Tanaka, Yuji Maruyama, Takumi Tsuchiya, Yoshihiko Uesugi, and Tatsuo Ishijima. "Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed." Plasma Chemistry & Plasma Processing 37, no. 3 (2017): 857. https://doi.org/10.1007/s11090-017-9803-0.

MLA (9th ed.) Citation

Tial, Mai, et al. "Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed." Plasma Chemistry & Plasma Processing, vol. 37, no. 3, 2017, p. 857, https://doi.org/10.1007/s11090-017-9803-0.