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Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed.

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Title: Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed.
Authors: Tial, Mai1, maikai@stu.kanazawa-u.ac.jp, Tanaka, Yasunori, tanaka@ec.t.kanazawa-u.ac.jp, Maruyama, Yuji1, Tsuchiya, Takumi1, Uesugi, Yoshihiko, Ishijima, Tatsuo2
Source: Plasma Chemistry & Plasma Processing; May2017, Vol. 37 Issue 3, p857-876, 20p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 122314838
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PubType: Academic Journal
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  Data: Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed.
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        Value: 10.1007/s11090-017-9803-0
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        Text: English
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      – TitleFull: Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed.
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              Text: May2017
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              Y: 2017
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