View in EDS HTML Full Text PDF Full Text

Loop Type of Inductively Coupled Thermal Plasmas System for Rapid Two-Dimensional Oxidation of Si Substrate Surface.

Saved in:
Bibliographic Details
Title: Loop Type of Inductively Coupled Thermal Plasmas System for Rapid Two-Dimensional Oxidation of Si Substrate Surface.
Authors: Tsuchiya, Takumi1, t-tsuchiya@stu.kanazawa-u.ac.jp, Tanaka, Yasunori1, tanaka@ec.t.kanazawa-u.ac.jp, Maruyama, Y.1, Fujita, A.1, Tial, M. K. S.1, Uesugi, Y.1, Ishijima, T.1, Yukimoto, T.2, Kawaura, H.2
Source: Plasma Chemistry & Plasma Processing; May2018, Vol. 38 Issue 3, p599-620, 22p
Database: Applied Science & Technology Source
Full text is not displayed to guests.
Description
ISSN:02724324
DOI:10.1007/s11090-018-9881-7