Effect of sputtering yield changes on the depth resolution in cluster beam depth-profiling of polymers.

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Bibliographic Details
Title: Effect of sputtering yield changes on the depth resolution in cluster beam depth-profiling of polymers.
Authors: Tuccitto, Nunzio1, n.tuccitto@unict.it, Bombace, Alessandra1, Torrisi, Alberto1, Licciardello, Antonino1
Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2018, Vol. 36 Issue 3, pN.PAG-N.PAG, 4p
Database: Applied Science & Technology Source
Description
ISSN:21662746
DOI:10.1116/1.5019698