Tuccitto, N., Bombace, A., Torrisi, A., & Licciardello, A. (2018). Effect of sputtering yield changes on the depth resolution in cluster beam depth-profiling of polymers. Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, 36(3), N.PAG. https://doi.org/10.1116/1.5019698
Chicago Style (17th ed.) CitationTuccitto, Nunzio, Alessandra Bombace, Alberto Torrisi, and Antonino Licciardello. "Effect of Sputtering Yield Changes on the Depth Resolution in Cluster Beam Depth-profiling of Polymers." Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics 36, no. 3 (2018): N.PAG. https://doi.org/10.1116/1.5019698.
MLA (9th ed.) CitationTuccitto, Nunzio, et al. "Effect of Sputtering Yield Changes on the Depth Resolution in Cluster Beam Depth-profiling of Polymers." Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, vol. 36, no. 3, 2018, p. N.PAG, https://doi.org/10.1116/1.5019698.