Stability of H-Terminated Diamond MOSFETs With V2O5/Al2O3 as Gate Insulator.
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| Title: | Stability of H-Terminated Diamond MOSFETs With V2O5/Al2O3 as Gate Insulator. |
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| Authors: | Verona, C.1, Benetti, M.2, Cannata, D.2, Ciccognani, W.3, Colangeli, S.3, Di Pietrantonio, F.2, Limiti, E.3, Marinelli, M.1, Verona-Rinati, G.1, gianluca.verona.rinati@uniroma2.it |
| Source: | IEEE Electron Device Letters; May2019, Vol. 40 Issue 5, p765-768, 4p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 136117348 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Stability of H-Terminated Diamond MOSFETs With V2O5/Al2O3 as Gate Insulator. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Verona%2C+C%2E%22">Verona, C.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Benetti%2C+M%2E%22">Benetti, M.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Cannata%2C+D%2E%22">Cannata, D.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Ciccognani%2C+W%2E%22">Ciccognani, W.</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Colangeli%2C+S%2E%22">Colangeli, S.</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Di+Pietrantonio%2C+F%2E%22">Di Pietrantonio, F.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Limiti%2C+E%2E%22">Limiti, E.</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Marinelli%2C+M%2E%22">Marinelli, M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Verona-Rinati%2C+G%2E%22">Verona-Rinati, G.</searchLink><relatesTo>1</relatesTo>, <i>gianluca.verona.rinati@uniroma2.it</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22IEEE+Electron+Device+Letters%22">IEEE Electron Device Letters</searchLink>; May2019, Vol. 40 Issue 5, p765-768, 4p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=136117348 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1109/LED.2019.2903578 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 4 StartPage: 765 Titles: – TitleFull: Stability of H-Terminated Diamond MOSFETs With V2O5/Al2O3 as Gate Insulator. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Verona, C. – PersonEntity: Name: NameFull: Benetti, M. – PersonEntity: Name: NameFull: Cannata, D. – PersonEntity: Name: NameFull: Ciccognani, W. – PersonEntity: Name: NameFull: Colangeli, S. – PersonEntity: Name: NameFull: Di Pietrantonio, F. – PersonEntity: Name: NameFull: Limiti, E. – PersonEntity: Name: NameFull: Marinelli, M. – PersonEntity: Name: NameFull: Verona-Rinati, G. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2019 Type: published Y: 2019 Identifiers: – Type: issn-print Value: 07413106 Numbering: – Type: volume Value: 40 – Type: issue Value: 5 Titles: – TitleFull: IEEE Electron Device Letters Type: main |
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