Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)].
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| Title: | Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]. |
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| Authors: | Huttunen-Saarivirta, E.1, Rajala, P.1, Carpén, L.1, Wang, J.2,3, Liu, F.2,4, Ghanbari, E.2, Mao, F.5, Dong, C.6, Yang, J.2, Sharifi-Asl, S.2, Macdonald, D. D.2, macdonald@berkeley.edu |
| Source: | Journal of The Electrochemical Society; 2019, Vol. 166 Issue 10, pY17-Y26, 10p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 137393451 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Huttunen-Saarivirta%2C+E%2E%22">Huttunen-Saarivirta, E.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Rajala%2C+P%2E%22">Rajala, P.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Carpén%2C+L%2E%22">Carpén, L.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Wang%2C+J%2E%22">Wang, J.</searchLink><relatesTo>2,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Liu%2C+F%2E%22">Liu, F.</searchLink><relatesTo>2,4</relatesTo><br /><searchLink fieldCode="AU" term="%22Ghanbari%2C+E%2E%22">Ghanbari, E.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Mao%2C+F%2E%22">Mao, F.</searchLink><relatesTo>5</relatesTo><br /><searchLink fieldCode="AU" term="%22Dong%2C+C%2E%22">Dong, C.</searchLink><relatesTo>6</relatesTo><br /><searchLink fieldCode="AU" term="%22Yang%2C+J%2E%22">Yang, J.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Sharifi-Asl%2C+S%2E%22">Sharifi-Asl, S.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Macdonald%2C+D%2E+D%2E%22">Macdonald, D. D.</searchLink><relatesTo>2</relatesTo>, <i>macdonald@berkeley.edu</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+The+Electrochemical+Society%22">Journal of The Electrochemical Society</searchLink>; 2019, Vol. 166 Issue 10, pY17-Y26, 10p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=137393451 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1149/2.1291910jes Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 10 StartPage: Y17 Titles: – TitleFull: Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Huttunen-Saarivirta, E. – PersonEntity: Name: NameFull: Rajala, P. – PersonEntity: Name: NameFull: Carpén, L. – PersonEntity: Name: NameFull: Wang, J. – PersonEntity: Name: NameFull: Liu, F. – PersonEntity: Name: NameFull: Ghanbari, E. – PersonEntity: Name: NameFull: Mao, F. – PersonEntity: Name: NameFull: Dong, C. – PersonEntity: Name: NameFull: Yang, J. – PersonEntity: Name: NameFull: Sharifi-Asl, S. – PersonEntity: Name: NameFull: Macdonald, D. D. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 08 Text: 2019 Type: published Y: 2019 Identifiers: – Type: issn-print Value: 00134651 Numbering: – Type: volume Value: 166 – Type: issue Value: 10 Titles: – TitleFull: Journal of The Electrochemical Society Type: main |
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