APA (7th ed.) Citation

Ozeki, G., Tanaka, Y., Sugiyama, Y., Nakano, Y., Ishijima, T., Uesugi, Y., . . . Kawaura, H. (2021). Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification. Plasma Chemistry & Plasma Processing, 41(1), 85. https://doi.org/10.1007/s11090-020-10144-5

Chicago Style (17th ed.) Citation

Ozeki, Genki, Yasunori Tanaka, Y. Sugiyama, Y. Nakano, T. Ishijima, Y. Uesugi, T. Yukimoto, and H. Kawaura. "Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification." Plasma Chemistry & Plasma Processing 41, no. 1 (2021): 85. https://doi.org/10.1007/s11090-020-10144-5.

MLA (9th ed.) Citation

Ozeki, Genki, et al. "Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification." Plasma Chemistry & Plasma Processing, vol. 41, no. 1, 2021, p. 85, https://doi.org/10.1007/s11090-020-10144-5.