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Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification.

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Title: Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification.
Authors: Ozeki, Genki1, ohzeki@stu.kanazawa-u.ac.jp, Tanaka, Yasunori1, tanaka@ec.t.kanazawa-u.ac.jp, Sugiyama, Y1, Nakano, Y1, Ishijima, T1, Uesugi, Y1, Yukimoto, T2, Kawaura, H2
Source: Plasma Chemistry & Plasma Processing; 2021, Vol. 41 Issue 1, p85-108, 24p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 148113889
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  Data: Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification.
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=148113889
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1007/s11090-020-10144-5
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      – Code: eng
        Text: English
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        PageCount: 24
        StartPage: 85
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      – TitleFull: Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification.
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            NameFull: Ozeki, Genki
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            NameFull: Tanaka, Yasunori
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            NameFull: Sugiyama, Y
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            NameFull: Ishijima, T
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            NameFull: Uesugi, Y
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            NameFull: Yukimoto, T
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            NameFull: Kawaura, H
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              Text: 2021
              Type: published
              Y: 2021
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              Value: 41
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            – TitleFull: Plasma Chemistry & Plasma Processing
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