Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification.
Saved in:
| Title: | Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification. |
|---|---|
| Authors: | Ozeki, Genki1, ohzeki@stu.kanazawa-u.ac.jp, Tanaka, Yasunori1, tanaka@ec.t.kanazawa-u.ac.jp, Sugiyama, Y1, Nakano, Y1, Ishijima, T1, Uesugi, Y1, Yukimoto, T2, Kawaura, H2 |
| Source: | Plasma Chemistry & Plasma Processing; 2021, Vol. 41 Issue 1, p85-108, 24p |
| Database: | Applied Science & Technology Source |
|
Full text is not displayed to guests.
Login for full access.
|
|
Be the first to leave a comment!