High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas.
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| Title: | High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas. |
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| Authors: | Hata, Kazufumi1, hachi-kun@stu.kanazawa-u.ac.jp, Tanaka, Yasunori1, tanaka@ec.t.kanazawa-u.ac.jp, Kano, N.1, Nakano, Y.1, Uesugi, Y.1, Ishijima, T.1 |
| Source: | Plasma Chemistry & Plasma Processing; May2021, Vol. 41 Issue 3, p757-777, 21p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 02724324 |
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| DOI: | 10.1007/s11090-021-10156-9 |
