APA (7th ed.) Citation

Hata, K., Tanaka, Y., Kano, N., Nakano, Y., Uesugi, Y., & Ishijima, T. (2021). High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas. Plasma Chemistry & Plasma Processing, 41(3), 757. https://doi.org/10.1007/s11090-021-10156-9

Chicago Style (17th ed.) Citation

Hata, Kazufumi, Yasunori Tanaka, N. Kano, Y. Nakano, Y. Uesugi, and T. Ishijima. "High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas." Plasma Chemistry & Plasma Processing 41, no. 3 (2021): 757. https://doi.org/10.1007/s11090-021-10156-9.

MLA (9th ed.) Citation

Hata, Kazufumi, et al. "High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas." Plasma Chemistry & Plasma Processing, vol. 41, no. 3, 2021, p. 757, https://doi.org/10.1007/s11090-021-10156-9.