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High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas.

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Title: High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas.
Authors: Hata, Kazufumi1, hachi-kun@stu.kanazawa-u.ac.jp, Tanaka, Yasunori1, tanaka@ec.t.kanazawa-u.ac.jp, Kano, N.1, Nakano, Y.1, Uesugi, Y.1, Ishijima, T.1
Source: Plasma Chemistry & Plasma Processing; May2021, Vol. 41 Issue 3, p757-777, 21p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 149848455
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas.
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1007/s11090-021-10156-9
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      – Code: eng
        Text: English
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        PageCount: 21
        StartPage: 757
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      – TitleFull: High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas.
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            NameFull: Hata, Kazufumi
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            NameFull: Tanaka, Yasunori
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            NameFull: Kano, N.
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            NameFull: Nakano, Y.
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            NameFull: Uesugi, Y.
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            – D: 01
              M: 05
              Text: May2021
              Type: published
              Y: 2021
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              Value: 41
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            – TitleFull: Plasma Chemistry & Plasma Processing
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