Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor.
Saved in:
| Title: | Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor. |
|---|---|
| Authors: | Yang, Bo1,2, gznuyangbo@163.com, Yang, Ni1,3, yqh@stu.kust.edu.cn, Zhao, Dan1, zhaoddan@stu.kust.edu.cn, Chen, Fengyang1, chenfengyang0315@163.com, Yuan, Xingping1, yuanxingping1013@163.com, Hou, Yanqing1, hhouyanqing@163.com, Xie, Gang1,3, hhouyanqing@163.com |
| Source: | Coatings (2079-6412); Jul2023, Vol. 13 Issue 7, p1184, 23p |
| Database: | Applied Science & Technology Source |
|
Full text is not displayed to guests.
Login for full access.
|
|
| ISSN: | 20796412 |
|---|---|
| DOI: | 10.3390/coatings13071184 |
