APA (7th ed.) Citation

Yang, B., Yang, N., Zhao, D., Chen, F., Yuan, X., Hou, Y., & Xie, G. (2023). Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor. Coatings (2079-6412), 13(7), 1184. https://doi.org/10.3390/coatings13071184

Chicago Style (17th ed.) Citation

Yang, Bo, Ni Yang, Dan Zhao, Fengyang Chen, Xingping Yuan, Yanqing Hou, and Gang Xie. "Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor." Coatings (2079-6412) 13, no. 7 (2023): 1184. https://doi.org/10.3390/coatings13071184.

MLA (9th ed.) Citation

Yang, Bo, et al. "Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor." Coatings (2079-6412), vol. 13, no. 7, 2023, p. 1184, https://doi.org/10.3390/coatings13071184.