View in EDS HTML Full Text PDF Full Text

Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor.

Saved in:
Bibliographic Details
Title: Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor.
Authors: Yang, Bo1,2, gznuyangbo@163.com, Yang, Ni1,3, yqh@stu.kust.edu.cn, Zhao, Dan1, zhaoddan@stu.kust.edu.cn, Chen, Fengyang1, chenfengyang0315@163.com, Yuan, Xingping1, yuanxingping1013@163.com, Hou, Yanqing1, hhouyanqing@163.com, Xie, Gang1,3, hhouyanqing@163.com
Source: Coatings (2079-6412); Jul2023, Vol. 13 Issue 7, p1184, 23p
Database: Applied Science & Technology Source
Full text is not displayed to guests.
FullText Links:
  – Type: pdflink
Text:
  Availability: 1
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 168598704
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Yang%2C+Bo%22">Yang, Bo</searchLink><relatesTo>1,2</relatesTo>, <i>gznuyangbo@163.com</i><br /><searchLink fieldCode="AU" term="%22Yang%2C+Ni%22">Yang, Ni</searchLink><relatesTo>1,3</relatesTo>, <i>yqh@stu.kust.edu.cn</i><br /><searchLink fieldCode="AU" term="%22Zhao%2C+Dan%22">Zhao, Dan</searchLink><relatesTo>1</relatesTo>, <i>zhaoddan@stu.kust.edu.cn</i><br /><searchLink fieldCode="AU" term="%22Chen%2C+Fengyang%22">Chen, Fengyang</searchLink><relatesTo>1</relatesTo>, <i>chenfengyang0315@163.com</i><br /><searchLink fieldCode="AU" term="%22Yuan%2C+Xingping%22">Yuan, Xingping</searchLink><relatesTo>1</relatesTo>, <i>yuanxingping1013@163.com</i><br /><searchLink fieldCode="AU" term="%22Hou%2C+Yanqing%22">Hou, Yanqing</searchLink><relatesTo>1</relatesTo>, <i>hhouyanqing@163.com</i><br /><searchLink fieldCode="AU" term="%22Xie%2C+Gang%22">Xie, Gang</searchLink><relatesTo>1,3</relatesTo>, <i>hhouyanqing@163.com</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Coatings+%282079-6412%29%22">Coatings (2079-6412)</searchLink>; Jul2023, Vol. 13 Issue 7, p1184, 23p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=168598704
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.3390/coatings13071184
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 23
        StartPage: 1184
    Titles:
      – TitleFull: Numerical Simulation of a Simplified Reaction Model for the Growth of Graphene via Chemical Vapor Deposition in Vertical Rotating Disk Reactor.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Yang, Bo
      – PersonEntity:
          Name:
            NameFull: Yang, Ni
      – PersonEntity:
          Name:
            NameFull: Zhao, Dan
      – PersonEntity:
          Name:
            NameFull: Chen, Fengyang
      – PersonEntity:
          Name:
            NameFull: Yuan, Xingping
      – PersonEntity:
          Name:
            NameFull: Hou, Yanqing
      – PersonEntity:
          Name:
            NameFull: Xie, Gang
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 07
              Text: Jul2023
              Type: published
              Y: 2023
          Identifiers:
            – Type: issn-print
              Value: 20796412
          Numbering:
            – Type: volume
              Value: 13
            – Type: issue
              Value: 7
          Titles:
            – TitleFull: Coatings (2079-6412)
              Type: main
ResultId 1