Electrical and dielectric properties of RF sputtered nano Al2O3 film annealed at 400 °C.

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Bibliographic Details
Title: Electrical and dielectric properties of RF sputtered nano Al2O3 film annealed at 400 °C.
Authors: Yalçın, Yeşim1, Arslan, Öznur1,2, İldeş, Caner3, Çokduygulular, Erman4, Çetinkaya, Çağlar2, Kınacı, Barış5,6, bariskinaci@gazi.edu.tr
Source: Journal of Materials Science: Materials in Electronics; Sep2023, Vol. 34 Issue 25, p1-10, 10p
Database: Applied Science & Technology Source
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