Rationally design of substrate surface topography toward the improvement of Cu-plated coating adhesion.
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| Title: | Rationally design of substrate surface topography toward the improvement of Cu-plated coating adhesion. |
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| Authors: | liu, Yulei1,2, Qi, Haichao2, Liu, Changfeng2, Li, Chao2, Zhao, Xinke3, Hou, Jingbin2, Li, Liangbin1, lbli@ustc.edu.cn |
| Source: | Journal of Materials Science: Materials in Electronics; Feb2024, Vol. 35 Issue 6, p1-9, 9p |
| Database: | Applied Science & Technology Source |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 175659666 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=175659666 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s10854-024-11985-y Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 9 StartPage: 1 Titles: – TitleFull: Rationally design of substrate surface topography toward the improvement of Cu-plated coating adhesion. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: liu, Yulei – PersonEntity: Name: NameFull: Qi, Haichao – PersonEntity: Name: NameFull: Liu, Changfeng – PersonEntity: Name: NameFull: Li, Chao – PersonEntity: Name: NameFull: Zhao, Xinke – PersonEntity: Name: NameFull: Hou, Jingbin – PersonEntity: Name: NameFull: Li, Liangbin IsPartOfRelationships: – BibEntity: Dates: – D: 21 M: 02 Text: Feb2024 Type: published Y: 2024 Identifiers: – Type: issn-print Value: 09574522 Numbering: – Type: volume Value: 35 – Type: issue Value: 6 Titles: – TitleFull: Journal of Materials Science: Materials in Electronics Type: main |
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