Optimizing misfit dislocation glide kinetics for enhanced threading dislocation density reduction in Si1−xGex/Si(001) layers through dynamic growth rate control.

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Bibliographic Details
Title: Optimizing misfit dislocation glide kinetics for enhanced threading dislocation density reduction in Si1−xGex/Si(001) layers through dynamic growth rate control.
Authors: Becker, L.1,2, lucas.becker@siltronic.com, Storck, P.1, Liu, Y.3, Schwalb, G.1, Schroeder, T.4,5, Fischer, I. A.2, Albrecht, M.4
Source: Journal of Applied Physics; 5/28/2024, Vol. 135 Issue 20, p1-9, 9p
Database: Applied Science & Technology Source
Description
ISSN:00218979
DOI:10.1063/5.0204318