Becker, L., Storck, P., Liu, Y., Schwalb, G., Schroeder, T., Fischer, I. A., & Albrecht, M. (2024). Optimizing misfit dislocation glide kinetics for enhanced threading dislocation density reduction in Si1−xGex/Si(001) layers through dynamic growth rate control. Journal of Applied Physics, 135(20), 1. https://doi.org/10.1063/5.0204318
Chicago Style (17th ed.) CitationBecker, L., P. Storck, Y. Liu, G. Schwalb, T. Schroeder, I. A. Fischer, and M. Albrecht. "Optimizing Misfit Dislocation Glide Kinetics for Enhanced Threading Dislocation Density Reduction in Si1−xGex/Si(001) Layers Through Dynamic Growth Rate Control." Journal of Applied Physics 135, no. 20 (2024): 1. https://doi.org/10.1063/5.0204318.
MLA (9th ed.) CitationBecker, L., et al. "Optimizing Misfit Dislocation Glide Kinetics for Enhanced Threading Dislocation Density Reduction in Si1−xGex/Si(001) Layers Through Dynamic Growth Rate Control." Journal of Applied Physics, vol. 135, no. 20, 2024, p. 1, https://doi.org/10.1063/5.0204318.