Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition.
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| Title: | Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition. |
|---|---|
| Authors: | Carnide, G.1,2, Simonnet, C.1,3, Parmar, D.1,2, Zavvou, Z.1,2, Klein, H.1,2, Conan, R.1, Pozsgay, V.1, Verdier, T.1, Villeneuve-Faure, C.1, Kahn, M. L.2, Stafford, L.3, Clergereaux, R.1, richard.clergereaux@laplace.univ-tlse.fr |
| Source: | Plasma Chemistry & Plasma Processing; May2024, Vol. 44 Issue 3, p1343-1356, 14p |
| Database: | Applied Science & Technology Source |
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| FullText | Links: – Type: pdflink Text: Availability: 1 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 178149684 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=178149684 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s11090-024-10455-x Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 14 StartPage: 1343 Titles: – TitleFull: Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Carnide, G. – PersonEntity: Name: NameFull: Simonnet, C. – PersonEntity: Name: NameFull: Parmar, D. – PersonEntity: Name: NameFull: Zavvou, Z. – PersonEntity: Name: NameFull: Klein, H. – PersonEntity: Name: NameFull: Conan, R. – PersonEntity: Name: NameFull: Pozsgay, V. – PersonEntity: Name: NameFull: Verdier, T. – PersonEntity: Name: NameFull: Villeneuve-Faure, C. – PersonEntity: Name: NameFull: Kahn, M. L. – PersonEntity: Name: NameFull: Stafford, L. – PersonEntity: Name: NameFull: Clergereaux, R. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2024 Type: published Y: 2024 Identifiers: – Type: issn-print Value: 02724324 Numbering: – Type: volume Value: 44 – Type: issue Value: 3 Titles: – TitleFull: Plasma Chemistry & Plasma Processing Type: main |
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