Bibliographic Details
| Title: |
Bessel‐Beam Direct Write of the Etch Mask in a Nano‐Film of Alumina for High‐Efficiency Si Solar Cells. |
| Authors: |
Katkus, Tomas1, Ng, Soon Hock1, Mu, Haoran1, Le, Nguyen Hoai An1, Stonytė, Dominyka2, Khajehsaeidimahabadi, Zahra1, Seniutinas, Gediminas1, Baltrukonis, Justas3, Ulčinas, Orestas3, Mikutis, Mindaugas3, Sabonis, Vytautas3, Nishijima, Yoshiaki4, Rienäcker, Michael5, Römer, Udo5, Krügener, Jan6, Peibst, Robby5,6, peibst@isfh.de, John, Sajeev7, john@physics.utoronto.ca, Juodkazis, Saulius1,2,8, sjuodkazis@swin.edu.au |
| Source: |
Advanced Engineering Materials; Nov2024, Vol. 26 Issue 21, p1-12, 12p |
| Database: |
Applied Science & Technology Source |
