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Bessel‐Beam Direct Write of the Etch Mask in a Nano‐Film of Alumina for High‐Efficiency Si Solar Cells.

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Title: Bessel‐Beam Direct Write of the Etch Mask in a Nano‐Film of Alumina for High‐Efficiency Si Solar Cells.
Authors: Katkus, Tomas1, Ng, Soon Hock1, Mu, Haoran1, Le, Nguyen Hoai An1, Stonytė, Dominyka2, Khajehsaeidimahabadi, Zahra1, Seniutinas, Gediminas1, Baltrukonis, Justas3, Ulčinas, Orestas3, Mikutis, Mindaugas3, Sabonis, Vytautas3, Nishijima, Yoshiaki4, Rienäcker, Michael5, Römer, Udo5, Krügener, Jan6, Peibst, Robby5,6, peibst@isfh.de, John, Sajeev7, john@physics.utoronto.ca, Juodkazis, Saulius1,2,8, sjuodkazis@swin.edu.au
Source: Advanced Engineering Materials; Nov2024, Vol. 26 Issue 21, p1-12, 12p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 180736775
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Bessel‐Beam Direct Write of the Etch Mask in a Nano‐Film of Alumina for High‐Efficiency Si Solar Cells.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Katkus%2C+Tomas%22">Katkus, Tomas</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Ng%2C+Soon+Hock%22">Ng, Soon Hock</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Mu%2C+Haoran%22">Mu, Haoran</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Le%2C+Nguyen+Hoai+An%22">Le, Nguyen Hoai An</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Stonytė%2C+Dominyka%22">Stonytė, Dominyka</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Khajehsaeidimahabadi%2C+Zahra%22">Khajehsaeidimahabadi, Zahra</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Seniutinas%2C+Gediminas%22">Seniutinas, Gediminas</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Baltrukonis%2C+Justas%22">Baltrukonis, Justas</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Ulčinas%2C+Orestas%22">Ulčinas, Orestas</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Mikutis%2C+Mindaugas%22">Mikutis, Mindaugas</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Sabonis%2C+Vytautas%22">Sabonis, Vytautas</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Nishijima%2C+Yoshiaki%22">Nishijima, Yoshiaki</searchLink><relatesTo>4</relatesTo><br /><searchLink fieldCode="AU" term="%22Rienäcker%2C+Michael%22">Rienäcker, Michael</searchLink><relatesTo>5</relatesTo><br /><searchLink fieldCode="AU" term="%22Römer%2C+Udo%22">Römer, Udo</searchLink><relatesTo>5</relatesTo><br /><searchLink fieldCode="AU" term="%22Krügener%2C+Jan%22">Krügener, Jan</searchLink><relatesTo>6</relatesTo><br /><searchLink fieldCode="AU" term="%22Peibst%2C+Robby%22">Peibst, Robby</searchLink><relatesTo>5,6</relatesTo>, <i>peibst@isfh.de</i><br /><searchLink fieldCode="AU" term="%22John%2C+Sajeev%22">John, Sajeev</searchLink><relatesTo>7</relatesTo>, <i>john@physics.utoronto.ca</i><br /><searchLink fieldCode="AU" term="%22Juodkazis%2C+Saulius%22">Juodkazis, Saulius</searchLink><relatesTo>1,2,8</relatesTo>, <i>sjuodkazis@swin.edu.au</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Advanced+Engineering+Materials%22">Advanced Engineering Materials</searchLink>; Nov2024, Vol. 26 Issue 21, p1-12, 12p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=180736775
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1002/adem.202400711
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 12
        StartPage: 1
    Titles:
      – TitleFull: Bessel‐Beam Direct Write of the Etch Mask in a Nano‐Film of Alumina for High‐Efficiency Si Solar Cells.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Katkus, Tomas
      – PersonEntity:
          Name:
            NameFull: Ng, Soon Hock
      – PersonEntity:
          Name:
            NameFull: Mu, Haoran
      – PersonEntity:
          Name:
            NameFull: Le, Nguyen Hoai An
      – PersonEntity:
          Name:
            NameFull: Stonytė, Dominyka
      – PersonEntity:
          Name:
            NameFull: Khajehsaeidimahabadi, Zahra
      – PersonEntity:
          Name:
            NameFull: Seniutinas, Gediminas
      – PersonEntity:
          Name:
            NameFull: Baltrukonis, Justas
      – PersonEntity:
          Name:
            NameFull: Ulčinas, Orestas
      – PersonEntity:
          Name:
            NameFull: Mikutis, Mindaugas
      – PersonEntity:
          Name:
            NameFull: Sabonis, Vytautas
      – PersonEntity:
          Name:
            NameFull: Nishijima, Yoshiaki
      – PersonEntity:
          Name:
            NameFull: Rienäcker, Michael
      – PersonEntity:
          Name:
            NameFull: Römer, Udo
      – PersonEntity:
          Name:
            NameFull: Krügener, Jan
      – PersonEntity:
          Name:
            NameFull: Peibst, Robby
      – PersonEntity:
          Name:
            NameFull: John, Sajeev
      – PersonEntity:
          Name:
            NameFull: Juodkazis, Saulius
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 11
              Text: Nov2024
              Type: published
              Y: 2024
          Identifiers:
            – Type: issn-print
              Value: 14381656
          Numbering:
            – Type: volume
              Value: 26
            – Type: issue
              Value: 21
          Titles:
            – TitleFull: Advanced Engineering Materials
              Type: main
ResultId 1