Role of ultra-thin tungsten interlayer in blocking nitrogen diffusion and reducing specific contact resistivity in titanium/n+-Si ohmic contacts.
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| Title: | Role of ultra-thin tungsten interlayer in blocking nitrogen diffusion and reducing specific contact resistivity in titanium/n+-Si ohmic contacts. |
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| Authors: | Chen, Xu1,2,3, Xu, Jing1,2,3, xujing@ime.ac.cn, Mao, Shujuan4, Liu, Chang1,2,3, Liu, Jinbiao1,2, Sun, XiangLie4, He, Yanping1,2,3, Wang, Guilei4, Zhao, Chao4, Luo, Jun1,2,3, luojun@ime.ac.cn |
| Source: | Journal of Materials Science: Materials in Electronics; Dec2024, Vol. 35 Issue 34, p1-9, 9p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 09574522 |
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| DOI: | 10.1007/s10854-024-13942-1 |
